SAN JOSE – Cadence Design Systems Inc. here today (May 7) announced it has acquired K2 Technologies Inc., a supplier of software for photomask data preparation applications. With the acquisition of K2 ...
LONDON — GenISys has started sampling to designers of MEMS based devices, sensors and flat panel displays a flexible simulation platform for mask aligner lithography that lets them virtually model, ...
The semiconductor industry is making noticeable progress on the development of advanced curvilinear photomasks, a technology that has broad implications for chip designs at the most advanced nodes and ...
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