SAN JOSE – Cadence Design Systems Inc. here today (May 7) announced it has acquired K2 Technologies Inc., a supplier of software for photomask data preparation applications. With the acquisition of K2 ...

LONDON — GenISys has started sampling to designers of MEMS based devices, sensors and flat panel displays a flexible simulation platform for mask aligner lithography that lets them virtually model, ...

The semiconductor industry is making noticeable progress on the development of advanced curvilinear photomasks, a technology that has broad implications for chip designs at the most advanced nodes and ...

The future of computing depends on miniaturization, and extreme ultraviolet lithography (EUV) is one key enabler. Until recently, we have relied on low numerical aperture (NA) EUV systems with an ...